Product

Japan DNK Aligner



http://www.kakenjse.co.jp/

MA1200

    
Main feature
  • Manually operated one-shot exposure system for experimentation and research, adaptable to glass, wafers, films and etc. Also ideal for small-lot production.
  • Selectable between (soft/hard) contact exposure and proximity exposure
  • Adaptable to max. 500mm×500mm substrates. Equipped with an optical system in an optimized combination of a super-high-pressure mercury lamp (500W, 1kW, 2kW or 3.5kW), mirrors, specialty lenses, condenser lenses and etc.



MA4200
 
     

Main feature
  • Our original parallelization mechanism enables making a proximity gap between a mask and a wafer with high accuracy.
  • Our original high speed image processing technique realizes high accuracy alignment.
  • The image processing technique can enable propositioning a thin, warped or fragile wafer such as quartz (optional).
  • Our original precision contact-pressure control mechanism enables a wafer to contact a mask with high accuracy.
  • A vacuum chuck is employed to fix a wafer on its back side, realizing high speed & accuracy and stable automatic transfer of the wafer.


MA5000
 
  

 

Maskless

    
Main feature
  • Direct imaging exposure is applicable to experimentation, research, prototype, small-lot production, or etc.
  • Applications range from high-end PCBs, high density packaging, flat panel displays, etc. to the micromachining field like MEMS, etc.
  • No photomask is needed in the lithography process, which minimizes development cost and time lag to the market.
  • Also, custom system composition is available to meet the customers' requests.



Roll to Roll 


 
Main feature
  • Not only proximity, but also (soft/hard) contact exposure is possible.
  • Able to handle large-size films in a 500mm wide or more.
  • Our original optical system allows selecting between single-side/double-side exposure. We even realized double-side exposure with one lamp.
  • Auto alignment function implemented. Employing special alignment illumination realizes locating transparent materials and etc.
  • Custom machine composition is available such as cut-sheet conveyor as well as Roll to Roll, to meet the customers' requests.
  • A substrate stage thermocontroller and a mask cooling feature are available (optional).

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